Clean (Ge)

The "Clean (Ge)" cleanliness group is part of the SNF/ExFab contamination policy.

The following is a list of equipment that fall into the "Clean (Ge)" category.

Equipment name & NEMO ID	Training Required & Charges	Cleanliness	Location	Notes
Wet Bench Resist Strip wbresstrip-1	Wet Bench Resist Strip	Clean (Ge), Semiclean, Flexible	SNF Paul G Allen L107 Cleanroom	Wet Resist Removal: SRS-100 or PRS1000

Equipment name & NEMO ID	Technique	Cleanliness	Primary Materials Etched	Process Temperature Range	Chemicals	Substrate Size	Substrate Type	Maximum Load
Wet Bench Resist Strip wbresstrip-1	Wet Chemical Processing Cleaning > Resist Removal > Wet Resist Removal	Clean (Ge), Semiclean, Flexible	Resist	20 °C - 60 °C	PRS-1000 SRS-100	Pieces 2" 3" 4"	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge) , (SiC)	25 4 inch wafers