Oven 110°C post-bake (oven110)
Overview
The 110°C Oven bakes the wafers with resist at 110ºC after the development, called post-bake.
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Process Temperature Range:
110 ºC
Substrate Type
Substrate Sizes
Notes:
Bakes wafers with resist after the development, called post-bake.
Lab Organization, Location, and NEMO Information
Lab Organization:
Location:
NEMO Area:
SNF: Photolithography
NEMO ID:
oven110
Training and Maintenance
Lab Facility:
Primary Trainer:
Backup Trainer(s):
Primary Maintenance:
Backup Maintenance:
Steps to become a tool user
-
Become a member of SNF.
- "All Litho" class is required before training on any of the lithography tools. Please send an email to all-litho-training@lists.stanford.edu to sign up for the All Litho class. Read more here: All Litho class.
- Study the relevant operating procedures:
- Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or SNF usage to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
- Contact the primary trainer: Cliff Knollenberg
