This is a summary of the downstream plasma etchers.
If you would like to see a summary of etchers for a specific material (i.e. SiO2 or poly silicon) please visit the materials page.
| Equipment Name | Processing Technique | Cleanliness | Primary Materials Etched | Other Materials Etched | Gases | Substrate Size | Maximum Load | Notes |
|---|---|---|---|---|---|---|---|---|
| Gasonics Aura Asher (gasonics) | Downstream/Remote Plasma Resist Removal | Clean, Semiclean | 25 |
Single wafer tool with auto loading from a cassette. Pieces need a pocket carrier wafer for... |
||||
| Matrix Plasma Resist Strip (matrix) | Downstream/Remote Plasma Resist Removal | Flexible | 25 |
Single wafer tool with auto loading from a cassette. Pieces need a pocket carrier wafer for... |
| Equipment Name | Processing Technique | Cleanliness | Primary Materials Etched | Other Materials Etched | Gases | Substrate Size | Maximum Load | Notes |
|---|---|---|---|---|---|---|---|---|
| Samco PC300 Plasma Etch System (samco) | Plasma Mode Etching | Flexible | Four 4" wafers or two 6" wafers and one 8" wafer |