The CHA e-beam evaporator is a thin film metal deposition tool. It will be used exclusively for the deposition of metals, with a particular focus on the most evaporated metals at SNF(Ti, Au, Cr, Al, Ni, Pt, Pd, Ag, Cu, etc..). This tool can run a maximum of 15 four-inch substrates and 3 Six-inch substrates in planetary configuration. Deposition rate is PID controlled, with automatic shutter closure at the defined end thickness.
For more than 300nm deposition, please contact Neel Mehta <nmehta26@stanford.edu> in advance
One shadowing session and a training is required. Training sessions are held 3pm Tuesdays and Thursdays; sign up through NEMO. Sessions limited to 4 attendees.