Processing Technique Equipment name & NEMO ID Cleanliness Exposure Wavelength Substrate Size Process Temperature Range Notes Stylus Tip Radius
Oven Bake Oven (White)
white-oven 		Flexible
0 °C - 200 °C

For LOL2000 bake or bakes which are not allowed in the other ovens and need higher temperatures, up to 200C, programmable.
Resist Post Bake Oven 110°C post-bake
oven110 		"All"
110 ºC

Bakes wafers with resist after the development, called post-bake.
Resist Prebake Oven 90°C prebake
oven90 		"All"
90 ºC

Bakes wafers after resist coating.
Oven Bake Oven BlueM 200°C to 430°C
bluem 		Flexible
0 °C - 430 °C

Convection in N2. Cure. Programmable.
Resist UV Cure Ultraviolet Photoresist Cure
uvcure 		"All" 254 nm