Germane

Chemical Formula:

GeH₄

Gases Equipment Tabs

Etch Equipment Table

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Anneal/Oxidation Equipment Table

Deposition Equipment
Equipment name & Badger ID	Cleanliness	Location	Material Thickness Range	Approved Materials supplied by Lab
AMAT Centurion Epitaxial System epi2	Clean	SNF Cleanroom Paul G Allen L107	50.00 Å - 3.00 μm	Ge Si SiGe
Tystar Bank 1 Tube 3 Poly B1T3 Flexible Poly	Flexible	SNF Cleanroom Paul G Allen L107	25.00 Å - 2.00 μm	Ge Si Si SiGe
Tystar Bank 3 Tube 12 Poly B3T12 Clean Poly	Clean	SNF Cleanroom Paul G Allen L107	25.00 Å - 2.00 μm	Si Si