Skip to content Skip to navigation

Standard Clean 1

Preferred Short Name: 
SC1
Chemical Formula: 
5:1:1 H2O:H2O2:NH4OH
Full Chemical Name (for In-Use Hazardous Chemicals card): 
DI water, Hydrogen peroxide, Ammonium hydroxide

SC1 is used to remove particles from substrates and as a surface preparation before going into growth furnaces. Due to the pH of the solution, particles removed from the surface are more likely to stay in solution than re-deposit back on the wafer surface.

Partial words okay.
Equipment name & Badger ID Training Required & Charges Cleanliness Location Chemicals Notes
Wet Bench Clean 1
wbclean-1
Wet Bench Clean1and2 Training
2.00 hours
SNF Cleanroom Paul G Allen L107

No resist allowed. Resist should have been removed at the wbclean_res-piranha.

Wet Bench Clean 2
wbclean-2
Wet Bench Clean1and2 Training
2.00 hours
SNF Cleanroom Paul G Allen L107

No resist allowed. Resist should have been removed at the wbclean_res-piranha

Wet Bench Flexcorr 1
wbflexcorr-1
Wet Bench Flexcorr 1and2 and 3and4 Training
2.00 hours
SNF Cleanroom Paul G Allen L107

Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.

Subscribe to