Quartz
Chemical Formula:
SiO2
| Equipment name & NEMO ID | Training Required & Charges | Cleanliness | Location | Notes |
|---|---|---|---|---|
|
Xactix Xenon Difluoride Etcher xactix |
Xactix Xenon Difluoride Etcher Training | "All" | SNF Paul G Allen L107 Cleanroom |
Isotropic Si etching; can be used for backside Si removal on small pieces |
Pages
| Equipment name & NEMO ID | Technique | Cleanliness | Primary Materials Etched | Gases | Substrate Size | Substrate Type | Maximum Load |
|---|---|---|---|---|---|---|---|
|
Xactix Xenon Difluoride Etcher xactix |
"All" |
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1 |
