There is automated equipment available for dispensing resists under "standard" conditions.
| Processing Technique | Equipment name & NEMO ID | Cleanliness | Substrate Size | Maximum Load (number of wafers) | Resist | Notes | Stylus Tip Radius |
|---|---|---|---|---|---|---|---|
| Resist Coat (automatic) |
SVG Resist Coat Track 1 svgcoat |
"All" | 25 4 inch wafers |
Automatic Resist spinning and bake |
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| Resist Coat (automatic) |
SVG Resist Coat Track 2 svgcoat2 |
"All" | 25 4 inch wafers |
Automatic HMDS, Resist spinning, and Bake. AZ5214IR Image Reversal. |