Processing Techniques Equipment name & NEMO IDsort descending Teaser Blurb Cleanliness Location
Oven Bake Oven (White)
white-oven 		Flexible SNF Paul G Allen L107 Cleanroom
Resist Post Bake Oven 110°C post-bake
oven110

The 110°C Oven bakes the wafers with resist at 110ºC after the development, called post-bake.

 "All" SNF Paul G Allen L107 Cleanroom
Resist Prebake Oven 90°C prebake
oven90

The 90°C Oven is the 90°C prebake oven. It is used to bake wafers after resist coating.

 "All" SNF Paul G Allen L107 Cleanroom
Oven Bake Oven BlueM 200°C to 430°C
bluem

The BlueM oven is for 200°C to 437°C temperature bakes, i.e. polyimide.

 Flexible SNF Paul G Allen L107 Cleanroom
Resist UV Cure Ultraviolet Photoresist Cure
uvcure

Ultraviolet Photoresist Cure, primary wavelength is 254 nm.

 "All" SNF Paul G Allen L107 Cleanroom