Our thermal ALD systems primarily use DI water as a co-reactant with the metal-organic precursor to deposit films. In practice, these chambers are often used for low temperature depositions since the cooling time is much shorter than the PE-ALD tools.

A couple of useful links that help navigate ALD research in general (not specific to the SNF) are: 

  • www.plasma-ald.com: a website created by Dr. Mark Sowa that has a survey of plasma ALD literature
  • www.atomiclimits.com: a website created by Professor Erwin Kessels, Eindhoven University, that provides a dynamic discussion of the ALD landscape.
Processing Techniques Equipment name & NEMO ID Teaser Blurb Cleanliness Location
Thermal ALD MVD
mvd

MVD is a molecular vapor deposition (MVD) system. It is a self assembling monolayers (SAMs)-based configuration of a Savannah S200 from Cambridge Nanotech with 1 SAMs delivery port and 4 standard atomic layer deposition (ALD) lines.  The system can accommodate pieces up to an 8" wafer.

 Flexible SNF Paul G Allen L107 Cleanroom
Thermal ALD Savannah ALD
savannah 		Flexible SNF Paul G Allen L107 Cleanroom