Piranha solutions are traditionally used for resist removal or as a second cleaning step after a dry resist removal to ensure clean substrates.
Equipment name & Badger ID | Training Required & Charges | Cleanliness | Location | Chemicals | Notes |
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Wet Bench Clean_res-piranha wbclean_res-piranha |
Wet Bench Clean Piranha/HF/Phosphoric Training 2.25 hours |
SNF Cleanroom Paul G Allen L107 |
Resist will be removed |
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Wet Bench Flexcorr 1 wbflexcorr-1 |
Wet Bench Flexcorr 1and2 and 3and4 Training 2.00 hours |
SNF Cleanroom Paul G Allen L107 |
Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only. |