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Silane 5% in He

Chemical Formula: 
5% SiH4 in He

Gases Equipment Tabs

Etch Equipment Table
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Anneal/Oxidation Equipment Table
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Deposition Equipment
Equipment name & Badger ID Cleanliness Location Material Thickness Range Approved Materials supplied by Lab
PlasmaTherm Shuttlelock PECVD System
ccp-dep
SNF Paul G Allen L107 Cleanroom
100.00 Å - 4.00 μm
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