Solvents are used to clean wafers that have materials exposed that are sensitive to the wet and dry resist strip techniques that use oxidation of the resist as the primary removal mechanism. Some common places where solvent cleans are used when there are exposed metals on the surface or when the substrate materials oxidize easily.
| Processing Technique | Equipment name & NEMO ID | Cleanliness | Chemicals | Substrate Size | Notes | Stylus Tip Radius |
|---|---|---|---|---|---|---|
| Solvent Cleaning, Metal Lift-off, Wet Chemical Processing |
Ex Fab Solvent Wet Bench wbexfab_solv |
Flexible | ||||
| Solvent Cleaning, Wet Resist Removal, Metal Lift-off |
Wet Bench Flexible Solvents wbflexsolv |
Flexible |
Manual solvent cleaning of substrates or resist removal. |
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| Solvent Cleaning, Wet Resist Removal, Wet Chemical Processing |
Wet Bench Flexible Solvents 1 wbflexsolv-1 |
Flexible |
Manual solvent cleaning, two ultrasonic baths. |
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| Solvent Cleaning, Wet Resist Removal, Wet Chemical Processing |
Wet Bench Flexible Solvents 2 wbflexsolv-2 |
Flexible |
Manual solvent cleaning, hot plate |
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| Solvent Cleaning, Wet Chemical Processing |
Wet Bench Solvent Lithography lithosolv |
Flexible |
Manual solvent cleaning of substrates or masks. Teflon coated metal tweezers cleaning. |