Processing Technique Equipment name & NEMO ID Cleanliness Chemicals Substrate Size Maximum Load (number of wafers) Developer Notes Stylus Tip Radius
Resist Develop (manual), Wet Chemical Processing Ex Fab Develop Wet Bench
wbexfab_dev 		Flexible

Manual development of resist in beakers. SNF approved developers only. No solvents!
Resist Develop (automatic) SVG Develop Track 1
svgdev 		"All"
25 4 inch wafers

Automatic development.
Resist Develop (automatic) SVG Develop Track 2
svgdev2 		"All"
25 4 inch wafers

Automatic development.
Resist Develop (manual), Wet Chemical Processing Wet Bench Miscellaneous
wbmiscres 		Flexible

Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents!