Resists
Photoresist (or resist, PR) is a UV light sensitive, organic material used to imprint the desired pattern onto a substrate. Upon exposure to the UV light photoresist becomes soluble (positive tone resist) or insoluble (negative tone resist) and is then selectively removed in a developer solution.
List of Resists
Equipment name & Badger ID |
Training Required & Charges | Cleanliness | Location | Chemicals | Notes |
|---|---|---|---|---|---|
|
EVG 101 Spray Coater evgspraycoat |
Spray Coater EVG 101 Training 1.50 hours |
SNF Cleanroom Paul G Allen L107 |
|
Spray coating of resists |
|
|
Headway 3 Manual Resist Spinner headway3 |
Resist Coat (manual) Headway 3 Training 1.00 hours |
SNF Exfab Paul G Allen 104 Stinson |
|
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|
Laurell Manual Resist Spinner laurell-R |
Laurell Manual Resist Spinner Training 1.00 hours |
SNF Cleanroom Paul G Allen L107 |
SU-8, LOL, Ebeam resists allowed. No Acetone allowed. |
