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Stanford Nanofabrication Facility
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Processing Techniques
Equipment name & NEMO ID
Teaser Blurb
Cleanliness
Location
Direct Write
Heidelberg MLA 150
heidelberg
Maskless writer that patterns without prior fabrication of masks.
All
SNF Exfab Paul G Allen 104 Stinson
Direct Write
Heidelberg MLA 150 - 2
heidelberg2
Maskless writer that patterns without prior fabrication of masks.
All
SNF Paul G Allen L107 Cleanroom
Detail Tab
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Processing Technique
Equipment name & NEMO ID
Cleanliness
Minimum Resolution
Exposure Wavelength
Substrate Size
Maximum Load (number of wafers)
Notes
Direct Write
Heidelberg MLA 150
heidelberg
All
1.00 μm
405 nm
Pieces
2"
3"
4"
6"
1
Direct Write
Direct Write
Heidelberg MLA 150 - 2
heidelberg2
All
0.60 μm
375 nm
Pieces
2"
3"
4"
6"
1
Direct Write