Equipment name & NEMO ID | Technique | Cleanliness | Materials Lab Supplied | Process Temperature Range | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|
CMP GnP POLI-400L cmp |
Flexible | ||||||
DISCO Backgrinder disco-backgrind |
Flexible | ||||||
DISCO Wafer Saw DISCO wafersaw |
Flexible |
, , , , , , , |
1x4", 1x6" or 1x8" wafer, or pieces | ||||
Xplore Micro Compounder N/A |
Flexible |
0 °C - 400 °C
|