The "All" cleanliness group is part of the SNF/ExFab contamination policy.
The following is a list of equipment that fall into the "All" category.
Stanford Nanofabrication Facility
Lab User Guide
Equipment Tables
| Equipment name & NEMO ID | Training Required & Charges | Cleanliness | Location | Notes |
|---|---|---|---|---|
|
SVG Develop Track 2 svgdev2 |
SVG Resist Develop tracks 1 and 2 Training | "All" | SNF Paul G Allen L107 Cleanroom |
Automatic development. |
|
SVG Resist Coat Track 1 svgcoat |
SVG Resist Coat Tracks 1 and 2 Training | "All" | SNF Paul G Allen L107 Cleanroom |
Automatic Resist spinning and bake |
|
SVG Resist Coat Track 2 svgcoat2 |
SVG Resist Coat Tracks 1 and 2 Training | "All" | SNF Paul G Allen L107 Cleanroom |
Automatic HMDS, Resist spinning, and Bake. AZ5214IR Image Reversal. |
|
Ultraviolet Photoresist Cure uvcure |
Ultraviolet Photoresist Cure Training | "All" | SNF Paul G Allen L107 Cleanroom | |
|
Woollam woollam |
Woollam Training | "All" | SNF Paul G Allen L107 Cleanroom | |
|
Xactix Xenon Difluoride Etcher xactix |
Xactix Xenon Difluoride Etcher Training | "All" | SNF Paul G Allen L107 Cleanroom |
Isotropic Si etching; can be used for backside Si removal on small pieces |