Overview
The PVA TePla IoN Wave 10 is a tabletop, batch-mode microwave plasma system that generates a controlled, low-temperature plasma for applications such as photoresist stripping, wafer descum, and surface cleaning.
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Primary Materials Etched
Primary Materials Etched:
Process Temperature Range:
20 °C - °C
Substrate Type
Substrate Sizes
Maximum Load:
25
Lab Organization, Location, and NEMO Information
Lab Organization:
Location:
NEMO Area:
NEMO ID:
Asher: PVA TePla
Training and Maintenance
Lab Facility:
Training Charges:
0.50 hours
Primary Trainer:
Backup Trainer(s):
Primary Maintenance: