| Processing Techniques | Equipment name & NEMO ID | Teaser Blurb | Cleanliness | Location |
|---|---|---|---|---|
| Vapor Etching |
SPTS uetch vapor etch uetch |
The SPTS uetch vapor system uses anhydrous HF and ethanol at reduced pressure and 45C to etch isotropically sacrificial silicon oxide layers, primarily to release silicon microstructures in MEMS devices. |
"All" | SNF Paul G Allen L107 Cleanroom |
| Vapor Etching |
Xactix Xenon Difluoride Etcher xactix |
The Xactix e-1 is a XeF2 (xenon difluoride) isotropic silicon etcher. |
"All" | SNF Paul G Allen L107 Cleanroom |
Stanford Nanofabrication Facility
Lab User Guide