KJL Evaporator 1 ()

Please see https://snsf.stanford.edu/facilities/fab/npc/evaporator for more details.

We have two Kurt J. Lesker high vacuum e-beam evaporators, a LAB18 and a PVD75 system, available in the Nanopatterning Cleanroom.

Features, capabilities, and restrictions in common:

• Load lock system for cleanliness and faster pump down times (10-15 minutes).

• Base pressures at 1 E-7 torr, down to 2 E-8 torr with gettering.

• Automated pre-programmed deposition recipes for standard use. Custom recipes and manual control available for advanced users.

• Quartz crystal monitors for deposition rate and thickness monitoring.

• KRI gridless end-hall Ar ion source for cleaning the substrate immediately prior to metal deposition.

• Source to substrate throw distance of 24 inches which reduces side wall accumulation for better liftoff results.

• Samples with patterned resists for lift-off processes allowed.

• Both systems have 8 crucible pockets for different materials. Currently allowed materials listed below. Contact staff about adding new materials.

• Precious metals (Au, Pd, Pt) are charged separately from the hourly usage of the instrument.

• Maximum deposition thickness of 200 nm. For thicker depositions, contact staff in advance.

• Deposition rates allowed from 0.2 A/s to 5 A/s, with defaults at 1.0 and 3.0 A/s. For faster deposition rates, contact staff.