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Silane
Chemical Formula:
SiH
4
Gases Equipment Tabs
Etch Equipment Table
Equipment name or Badger ID
Partial words okay.
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Anneal/Oxidation Equipment Table
Equipment name or Badger ID
Partial words okay.
Deposition Equipment
Equipment name & Badger ID
Cleanliness
Location
Material Thickness Range
Approved Materials supplied by Lab
Aixtron MOCVD - III-N system
aix-ccs
Clean (MOCVD)
SNF MOCVD Paul G Allen 213XA
0.00
-
5.00 μm
AlGaN
AlN
GaN
III-N materials
InAlN
InGaAlN
InGaN
InN
Aixtron MOCVD - III-V system
aix200
Flexible
SNF MOCVD Paul G Allen 213XA
0.00
-
5.00 μm
AlAs
AlGaAs
GaAs
GaP
GaPN
III-V materials
InAs
InGaAs
InGaAsN
AMAT Centurion Epitaxial System
epi2
Clean
SNF Cleanroom Paul G Allen L107
50.00 Å
-
3.00 μm
Ge
Si
SiGe
PlasmaTherm Versaline HDP CVD System
hdpcvd
All
SNF Cleanroom Paul G Allen L107
500.00 Å
-
4.00 μm
Si
Si3N4
SiC
SiO
2
SiON
Tystar Bank 1 Tube 3 Poly
B1T3 Flexible Poly
Flexible
SNF Cleanroom Paul G Allen L107
25.00 Å
-
2.00 μm
Tystar Bank 1 Tube 4 LTO
B1T4 Flexible LTO
Flexible
SNF Cleanroom Paul G Allen L107
25.00 Å
-
2.00 μm
Tystar Bank 2 Tube 8 LTO
B2T8 Clean LTO
Clean
SNF Cleanroom Paul G Allen L107
25.00 Å
-
2.00 μm
Tystar Bank 3 Tube 12 Poly
B3T12 Clean Poly
Clean
SNF Cleanroom Paul G Allen L107
25.00 Å
-
2.00 μm