SiNx PECVD and Nanostructure Etching Recipe Development
Project Type:
E241
Date:
June 2014
Areas of Interest:
PECVD SiNx stress, Nanosphere etching
Processing Technique (former Function and Method):
Researchers and (Mentors):
Yusi Chen and Muyu Xue
List of Important Equipment:
Presentation(s):
