Plasma mode etching is a form of capacitively coupled plasma etching wherein the substrate is sitting on a grounded electrode as opposed to the powered electrode. The bias voltage at the wafer level is much lower in this mode and hence is the preferred option for damage free etching of thin films. In plasma mode etching, the two electodes are roughly of the same size.
| Processing Techniques | Equipment name & NEMO ID | Teaser Blurb | Cleanliness | Location |
|---|---|---|---|---|
| Plasma Mode Etching, Reactive Ion Etching (RIE), Downstream/Remote Plasma Resist Removal |
Samco PC300 Plasma Etch System samco |
The SAMCO etcher is a multifunctional etcher that can operate in either the RIE, plasma etch or Downstream plasma modes |
Flexible | SNF Paul G Allen L107 Cleanroom |