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Ethanol vapor
Chemical Formula:
C
2
H
5
OH
Gases Equipment Tabs
Etch Equipment Table
Equipment name or Badger ID
Partial words okay.
Etch Equipment
Equipment name & Badger ID
Cleanliness
Location
Primary Materials Etched
Other Materials Etched
Gases
SPTS uetch vapor etch
uetch
All
SNF Cleanroom Paul G Allen L107
SiO
2
C
2
H
5
OH
HF vapor
Anneal/Oxidation Equipment Table
Equipment name or Badger ID
Partial words okay.
Deposition Equipment
Equipment name & Badger ID
Cleanliness
Location
Material Thickness Range
Approved Materials supplied by Lab
First Nano carbon nanotube CVD furnace
cvd-nanotube
Flexible
SNF Exfab Paul G Allen L119 Año Nuevo
C