Magnetically Enhanced RIE (MERIE)

MERIE, Magnetically Enhanced Reactive Ion Etching, is where a magnetic field is applied in a capacitively coupled plasma etcher. Applied magnetic field enhances the etch rate while reducing the bias voltage simultaneously for a given RF power setting. A rotating magnetic field is generated by varying the current between the four electromagnetic coils placed around the electrode.

Technique Tabs

Main Tab

Processing Techniques	Equipment name & NEMO ID	Teaser Blurb	Cleanliness	Location
Magnetically Enhanced RIE (MERIE)	AMAT P5000 Etcher p5000etch	P5000 is a magnetically enhanced reactive ion etching system (MERIE) for etching silicon based dielectrics (silicon dioxide, silcon nitride, etc.). P5000 is currently classified as CMOS restricted.	Clean, Clean (Ge), Semiclean	SNF Cleanroom Paul G Allen L107

Detail Tab

Processing Technique	Equipment name & NEMO ID	Cleanliness	Primary Materials Etched	Other Materials Etched	Gases
Magnetically Enhanced RIE (MERIE)	AMAT P5000 Etcher p5000etch	Clean, Clean (Ge), Semiclean	Si Si3N4 SiGe SiO₂ SiON	C C C dimethylpolysiloxane poly(p-xylylene) SiC Ti Various C-based W WSi₂ PI Resist Ti Tungsten	80% He/ 20%O₂ Ar CF₄ CHF₃ Cl₂ HBr He N₂ NF₃ O₂ SF₆