Metal Lift-off

Lift-off is a method of patterning a target material (typical a metal) using a sacrificial layer (typically photoresist) to define the pattern. First, the sacrificial layer is applied and patterned optically; then the target material is deposited on top. The final step is to dissolve the resist, lifting away any metal that was on top of it and leaving the rest of the patterned metal on the substrate. Link to Lift-off Processing at SNF.

UCSB has an excellent lift-off tutorial here.

Technique Tabs

Main Tab

Processing Techniques	Equipment name & NEMO ID	Teaser Blurb	Cleanliness	Location
Solvent Cleaning, Metal Lift-off, Wet Chemical Processing	Ex Fab Solvent Wet Bench wbexfab_solv		Flexible	SNF Exfab Paul G Allen 104 Stinson
Solvent Cleaning, Wet Resist Removal, Metal Lift-off	Wet Bench Flexible Solvents wbflexsolv	Manual solvent cleaning of materials in the flexible cleanliness group.	Flexible	SNF Cleanroom Paul G Allen L107

Detail Tab

Processing Technique	Equipment name & NEMO ID	Cleanliness	Chemicals	Substrate Size	Notes
Solvent Cleaning, Metal Lift-off, Wet Chemical Processing	Ex Fab Solvent Wet Bench wbexfab_solv	Flexible	Solvents	Pieces 2" 3" 4" 6" 8" Other
Solvent Cleaning, Wet Resist Removal, Metal Lift-off	Wet Bench Flexible Solvents wbflexsolv	Flexible	Solvents	Pieces 2" 3" 4" 6"	Manual solvent cleaning of substrates or resist removal.