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Stanford Nanofabrication Facility
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APTES
Chemical Formula:
C
9
H
23
NO
3
Si
(3-Aminopropyl)triethoxysilane
Equipment Tabs
Deposition Equipment
Equipment name or Badger ID
Partial words okay.
Deposition Equipment
Equipment name & Badger ID
Cleanliness
Location
Material Thickness Range
Approved Materials supplied by Lab
MVD
mvd
Flexible
SNF Paul G Allen L107 Cleanroom
1.00 Å
-
50.00 nm
Al
2
O
3
C
21
H
46
O
3
Si
C
9
H
23
NO
3
Si
HfO
2
HN(CH
2
CH
2
NH
2
)
2
Various
Various Dielectrics
