PMMA can be used as a negative photoresist.
| Equipment name & NEMO ID | Training Required & Charges | Cleanliness | Location | Chemicals | Notes |
|---|---|---|---|---|---|
|
Headway Manual Resist Spinner headway2 |
Resist Coat (manual) Headway Manual Training 1.00 hours |
SNF Paul G Allen L107 Cleanroom |
|
Adjustable spin speeds, spin time. SNF-acceptable resists or polymers. Ebeam resists |
|
|
Laurell Manual Resist Spinner laurell-R |
Laurell Manual Resist Spinner Training 1.00 hours |
SNF Paul G Allen L107 Cleanroom |
SU-8, LOL, Ebeam resists allowed. No Acetone allowed. |