Introduction of HD4110 Polyimide photoresist in SNF/ExFab
PROM Request Title:
Introduction of HD4110 Polyimide photoresist in SNF/ExFab
PROM Request Summary:
Bring in new chemistry to use with SNF and ExFab spin coating and exposure tools.
PROM Date:
07/29/2019
PROM Decision:
Approved.
Link to PROM Request and supporting documentation:
