PECVD process optimization for low-loss silicon based thin films in photonics

Project Type:

E241

Date:

June 2025 (all day)

Areas of Interest:

PECVD

Report:

PECVD process optimization for low-loss silicon based thin films in photonics - Final Report

Processing Technique (former Function and Method):

Plasma Enhanced (PE) CVD

Researchers and (Mentors):

Sara Azzouz, Tim Zhao (Lavendra Mandyam, Don Gardner)

List of Important Equipment:

Oxford Plasma Pro PECVD (Ox-PECVD)

PlasmaTherm Shuttlelock PECVD System (ccp-dep)