High-k/SiO2 interface Charge Characterization for ALD tools
Project Type:
E241
Date:
March 2011
Areas of Interest:
Charge density study for HfO2 and Al2o3
Processing Technique (former Function and Method):
Researchers and (Mentors):
Hong-Yu Chen, Luckshitha, (J Provine)
List of Important Equipment:
