Tetraethyl Orthosilicate (Si(OC2H5)4)

Chemical Formula: 
Si(OC2H5)4
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Deposition Equipment
Equipment name & NEMO ID Cleanliness Location Material Thickness Range Approved Materials supplied by Lab
Tystar Bank 3 Tube 11 TEOS
B3T11 Clean TEOS
SNF Paul G Allen L107 Cleanroom
25.00 Å - 2.00 μm