Chemical Formula:
[(CH3)3Si]2NH
HMDS (Hexamethyldisilazane) is used in the photolithography process as an adhesion promoter for resists.
| Equipment name & NEMO ID | Training Required & Charges | Cleanliness |
Location |
Chemicals | Notes |
|---|---|---|---|---|---|
|
HMDS Vapor Prime Oven, YES2 yes2 |
Exfab YES2 HMDS oven training 0.00 hours |
SNF Exfab Paul G Allen 104 Stinson |
|
Singe and prime. No Resist allowed! |
|
|
HMDS Vapor Prime Oven, YES yes |
YES Prime Oven Training | SNF Paul G Allen L107 Cleanroom |
Two programs: Singe and HMDS prime or Singe only. No Resist allowed! |