The MOCVD lab houses two aixtron MOCVD tools for epitaxial growth of compound semiconductors, one for III-V materials like GaAs, the other for III-N materials like GaN. Sample size: pieces, 50mm wafers and 100mm wafers.
Following is a list of tools located in this lab space (room).
| Equipment name & NEMO ID | Training Required & Charges | Cleanliness | Location | Notes |
|---|---|---|---|---|
|
Aixtron MOCVD - III-N system aix-ccs |
MOCVD - III-N Aixtron training | Clean (MOCVD) | SNF MOCVD Paul G Allen 213XA |
N and P doping available. For Si clean: SC1, SC2, HF dip. For Sapphire clean: SC1, SC2. For GaN template on Si or Sapphire: Piranha, SC1, SC2. |
|
Aixtron MOCVD - III-V system aix200 |
MOCVD - III-V Aixtron training | Flexible | SNF MOCVD Paul G Allen 213XA |
N and P doping available. For Si clean: SC1, SC2, HF dip. For III-V clean: HCl or HF dip. |