Skip to content
Skip to navigation
Stanford Nanofabrication Facility
Lab User Guide
Navigation menu
Guide Main Menu
SNF Home
Guide Home
Guide Home Overview
Lab Spaces
Techniques
Overview
Processing Techniques
Projects
Fab Project Courses: E241 & EE412
Community Service Projects
nano@stanford Fellowship Projects
Nano Nuggets
Processes
Runsheets
Safety & Policies
Overview
SNF Lab Manual
Safety Training
SDS
Gowning lab specific
Garment checkout for Cleanroom L107
Gowning Procedure for Cleanroom L107
Mavericks (ExFab Room 155) Policies
Prescription Safety Glasses
Training
Overview/Equipment List
Upcoming Training, link to NEMO
Training Course Online
Training Shadowing Form
Training Videos
All Litho class
Materials
Overview
Chemicals & Materials
Cleanliness Groups
New Process or Material Requests (PROM)
ProM Committee
ProM Approach
TMAH Protocols
TMAH Checklist
PROM (PRocess and Materials) Form
PROM archive view
Chemicals List
Acids
Bases
Developers
Metal Etchants
Other Chemicals
Primer
Resists
Solvents
Materials List
Substrate Types and Sizes
Substrate Sizes
Gases List
Useful Links
Run NEMO (login required)
NEMO User Guide
Events
External Links
Wafer Dopant and Resistivity Specs
Face shield cleaning using steamer
Tool Monitoring
People
Staff List
For Emergencies
Technical Liaisons
Consultants
Equipment
Equipment Name Table
Characterization (link to Processing Techniques)
CVD (link to Processing Techniques)
Doping (link to Processing Techniques)
Dry Etch (link to Processing Techniques)
Metallization (link to Processing Techniques)
Oxidation and Annealing (link to Processing Techniques)
Photolithography (link to Processing Techniques)
Wet Chemical Processing (link to Processing Techniques)
Materials
Overview
Chemicals & Materials
Cleanliness Groups
New Process or Material Requests (PROM)
ProM Committee
ProM Approach
TMAH Protocols
TMAH Checklist
PROM (PRocess and Materials) Form
PROM archive view
Chemicals List
Acids
Bases
Developers
Metal Etchants
Other Chemicals
Primer
Resists
Solvents
Materials List
Substrate Types and Sizes
Substrate Sizes
Gases List
Silane 2% in Nitrogen
Chemical Formula:
2% SiH
4
in N
2
Gases Equipment Tabs
Etch Equipment Table
Equipment name or Badger ID
Partial words okay.
No equipment matches all of the filter criteria you have set above.
Anneal/Oxidation Equipment Table
Equipment name or Badger ID
Partial words okay.
No equipment matches all of the filter criteria you have set above.
