Equipment Tables
| Equipment name & NEMO ID | Technique | Cleanliness | Material Thickness Range | Materials Lab Supplied | Substrate Size | Substrate Type | Maximum Load |
|---|---|---|---|---|---|---|---|
|
CHA Solutions II Evaporator cha-evap |
Flexible |
0.00 -
300.00 nm
|
4"x15 or 6"x3 wafers or pieces | ||||
|
Intlvac Evaporator Intlvac_evap |
Clean, Semiclean |
0.00 -
0.50 μm
|
12 4 inch wafers, 2 6 inch wafers |