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Process flow for etching Silicon Germanium on contaminated wafers with aluminum in LAMpoly (clean)

PROM Request Title: 
Process flow for etching Silicon Germanium on contaminated wafers with aluminum in LAMpoly (clean)
PROM Request Summary: 
Request to modify contamination policy and allow contaminated wafers on clean etcher.
PROM Date: 
03/16/2015
PROM Decision: 
Request approved for data collection. Data will be reviewed by PROM committee.