Etching Polyacrylonitrile-Lithium Perchlorate membrane with Au mask
PROM Request Title:
Etching Polyacrylonitrile-Lithium Perchlorate membrane with Au mask
PROM Request Summary:
Request to use PAN-LiClO4 film in PT-OX. Concern is using Li compounds in the shared equipment.
PROM Decision:
Approved for documented runs. Additional runs or larger substrates will require review by PROM committee.
Link to PROM Request and supporting documentation: