Development of Four Nitride Films; TiN, Hf3N4, WN, and AlNDevelopment of Four Nitride Films; TiN, Hf3N4, WN, and AlN

Project Type:

E241

Date:

December 2010 (all day)

Areas of Interest:

ALD nitride films

Report:

Processing Technique (former Function and Method):

Researchers and (Mentors):

Shingo Yoneoka, Yi-Hsuan, Scott Lee, Chu-En Chang, (J Provine)

List of Important Equipment:

Savannah ALD (savannah)