Development of Four Nitride Films; TiN, Hf3N4, WN, and AlNDevelopment of Four Nitride Films; TiN, Hf3N4, WN, and AlN
Project Type:
E241
Date:
December 2010
Areas of Interest:
ALD nitride films
Report(s):
Processing Technique (former Function and Method):
Researchers and (Mentors):
Shingo Yoneoka, Yi-Hsuan, Scott Lee, Chu-En Chang, (J Provine)
List of Important Equipment:
