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Chlorodifluoromethane
Chemical Formula:
CHClF
2
Gases Equipment Tabs
Etch Equipment Table
Equipment name or Badger ID
Partial words okay.
Etch Equipment
Equipment name & Badger ID
Cleanliness
Location
Primary Materials Etched
Other Materials Etched
Gases
MRC Reactive Ion Etcher
mrc
Flexible
SNF Cleanroom Paul G Allen L107
Metals
Various Dielectrics
Metal oxides
PI
Ar
CHClF
2
CHF
3
O
2
SF
6
Anneal/Oxidation Equipment Table
Equipment name or Badger ID
Partial words okay.
No equipment matches all of the filter criteria you have set above.