Processing Technique Equipment name & NEMO ID Cleanliness Material Thickness Range Substrate Size Maximum Load (number of wafers) Process Temperature Range Stylus Tip Radius
Sheet Resistance Measurement, Hall measurement Lakeshore Hall Measurement System
LakeshoreHall 		"All"
100.00 μm - 1000.00 μm
1 piece
-258 °C - 1000 °C