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Stanford Nanofabrication Facility
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PDMS
Chemical Formula:
dimethylpolysiloxane
Equipment Tabs
Deposition Equipment
Equipment name or Badger ID
Partial words okay.
Deposition Equipment
Equipment name & Badger ID
Cleanliness
Location
Material Thickness Range
Approved Materials supplied by Lab
PDMS Workbench
Flexible
SNF Exfab Paul G Allen 155 Mavericks
dimethylpolysiloxane
Etching Equipment
Equipment name or Badger ID
Partial words okay.
Etch Equipment
Equipment name & Badger ID
Cleanliness
Location
Primary Materials Etched
Other Materials Etched
AMAT P5000 Etcher
p5000etch
Clean
Clean (Ge)
Semiclean
SNF Cleanroom Paul G Allen L107
Si
Si3N4
SiGe
SiO
2
SiON
C
C
C
dimethylpolysiloxane
poly(p-xylylene)
SiC
Ti
Various C-based
W
WSi
2
PI
Resist
Ti Tungsten
Samco PC300 Plasma Etch System
samco
Flexible
SNF Cleanroom Paul G Allen L107
Resist
dimethylpolysiloxane
Si
Si3N4
SiO
2
SiON
Various polymers
PI
Technics Asher
technics
Flexible
SNF Cleanroom Paul G Allen L107
Resist
dimethylpolysiloxane
poly(p-xylylene)
PI
Projects
SOP- Gold-PDMS adhesion enhancement
-- (Nano Nugget)
Sub-micron metal patterning on polymer substrates using nitride nanostencil
-- (Report)
Microfluidic Device Fabrication Protocol and Troubleshooting Guide in the Stanford Flexible Cleanroom
Nanoscribe Microfluidic Devices at SNF
Sub-micron metal patterning on polymer substrates using nitride nanostencil