Mechanical deformation of self-assembled inverse structures

Project Type:

E241

Date:

March 2020 (all day)

Areas of Interest:

3D templates for nanostructures, sol-gel processing

Report:

F19- Self-Assembly Schemes for Fabrication of Inverse Opals SOP- Final Report

W20- Mechanical Deformationof Self-Assembled Inverse Structures Final Report

Processing Technique (former Function and Method):

Patterning

Researchers and (Mentors):

David Doan, John Kulikowski, (Swaroop Kommera)

List of Important Equipment:

Nanoscribe Photonics GT (nanoscribe)

Nano Nugget:

SOP for particle self assembly and RDF characterization

Highly monodisperse 4 um PMMA spherical particles were assembled in PDMS wells on either a silicon substrate or a glass coverslip. In order to quantify the order of one assembly compared to another, a radial distribution function (RDF) is used.

Read more about SOP for particle self assembly and RDF characterization

SOP for positive photoresist on Nanoscribe

SOP for using SPR-220 and AZ4620 positive photoresists on Nanoscribe using the oil immersion mode.

Read more about SOP for positive photoresist on Nanoscribe

Self-Assembly Schemes for the Fabrication of Inverse Opals

The nanoscribe can be used to create template structures for particle self assembly, and details about inverse opal BCC and FCC structures are described.

Read more about Self-Assembly Schemes for the Fabrication of Inverse Opals

Presentation:

Mechanical deformation of self-assembled inverse structures- Fall 2019 Final Presentation