Project Type: 
E241
Date: 
June 2018 (all day)
Areas of Interest: 
Grayscale lithography modeling, Parylene liftoff process development
Report: 
Grayscale Lithography and Resist Reflow for Parylene Patterning- Final Report
Processing Technique (former Function and Method): 
Photolithography
Patterning
Researchers and (Mentors): 
Charmaine Chia, Joel Martis, (Swaroop Kommera)
List of Important Equipment: 
Heidelberg MLA 150 (heidelberg)
PDS 2010 LABCOTER™ 2 Parylene Deposition System (parcoater)
Nano Nugget: 
Presentation: 
Grayscale Lithography and Resist Reflow for Parylene Patterning- Final Presentation