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Grayscale Lithography and Resist Reflow for Parylene Patterning

Project Type: 
E241
Date: 
June 2018
Areas of Interest: 
Grayscale lithography modeling, Parylene liftoff process development
Report(s): 
Grayscale Lithography and Resist Reflow for Parylene Patterning- Final Report
Processing Technique (former Function and Method): 
Photolithography
Patterning
Researchers and (Mentors): 
Charmaine Chia, Joel Martis, (Swaroop Kommera)
List of Important Equipment: 
Heidelberg MLA 150 (heidelberg)
PDS 2010 LABCOTER™ 2 Parylene Deposition System (parcoater)
Nano Nugget(s): 

A Study of Analytical and Empirical Resist Reflow in the Literature

A summary of the main findings in the literature regarding resist reflow. 

Presentation(s): 
Grayscale Lithography and Resist Reflow for Parylene Patterning- Final Presentation