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3D, pourous, electroplated metallic structures using two-photon lithography templates

Project Type: 
E241
Date: 
March 2020
Areas of Interest: 
3D patterning and electroplating
Report(s): 
F19- Electroplated, Porous, 3D Metallic Structures using Sacrificial Two-Photon Lithography Templates- Final Report
W20- Electroplated, Porous, 3D Metallic Structures using Sacrificial Two-Photon Lithography (Nanoscribe) Templates Final Report
Processing Technique (former Function and Method): 
Patterning
3D Printing
Researchers and (Mentors): 
Quianying Wu, Alisha Piazza, (Swaroop Kommera), (Tony Ricco)
List of Important Equipment: 
Nanoscribe Photonics GT (nanoscribe)
Nano Nugget(s): 
diagram of process

Patterning SPR220 on Reflective Materials with Nanoscribe

Processing details for using SPR-220 positive resist on a reflective metal surface to make 3D structures on the Nanoscribe.

Improving adhesion and preventing collapsing of Nanoscribe resist IP-Dip

An improved substrate pretreatment protocol is therefore developed that results in better adhesion.

Presentation(s): 
3D, pourous, electroplated metallic structures using two-photon lithography templates- Fall 2019 Final Presentation