2016-2017 EE410/EE312 NMOS Process Flow without isolation

This is the run sheet for the depletion NMOS process set up by Lisa Rozario. This process is a modification of the EE410/EE312 depletion NMOS process utilized in winter 2016 EE410 and winter 2017 EE312 and uses the mask set "Depletion NMOS_SNF410"