SNF: Characterization and Testing

Equipment Tables

Equipment name & NEMO ID	Technique	Cleanliness	Substrate Size	Substrate Type	Maximum Load
Flexus 2320 Stress Tester stresstest	Characterization > Film Stress Measurement	"All"	3" 4" 6" 8"	Silicon (Si) Silicon Germanium (SiGe) Quartz (SiO2) Sapphire (Al₂O₃) Glass (SiO₂) Germanium (Ge) Gallium Nitride (GaN) III-V (III-V) Gallium Arsenide (GaAs)	1
Nanospec 210XP nanospec2	Characterization > Reflectometry	"All"	Pieces 2" 3" 4" 6"	Silicon (Si) Silicon Germanium (SiGe) Quartz (SiO2) Sapphire (Al₂O₃) Glass (SiO₂) Germanium (Ge) Gallium Nitride (GaN) III-V (III-V) Gallium Arsenide (GaAs)
Prometrix Resistivity Mapping System prometrix	Characterization > Sheet Resistance Measurement	"All"	2" 3" 4" 6" 8"	Silicon (Si) Silicon Germanium (SiGe) Quartz (SiO2) Sapphire (Al₂O₃) Glass (SiO₂) Germanium (Ge) Gallium Nitride (GaN) III-V (III-V) Gallium Arsenide (GaAs)	1
Reflectance Spectrometer Filmetrics F40 filmetrics	Characterization > Reflectometry	"All"			one piece or wafer
Woollam woollam	Characterization > Ellipsometry	"All"	Pieces 2" 3" 4" 6" 8"	Silicon (Si) Silicon Germanium (SiGe) Quartz (SiO2) Sapphire (Al₂O₃) Glass (SiO₂) Germanium (Ge) Silicon Carbide (SiC) Gallium Nitride (GaN) III-V (III-V) Gallium Arsenide (GaAs) Polymer (Various) Carbon Polymer Based (Various) Lithium Niobate (LiNb) Other (ProMCom approval required) (Various)	1