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SiNWs Thermoelectric Device Process Development

Project Type: 
March 2020
Areas of Interest: 
SiNW formation, MACE Etching
Processing Technique (former Function and Method): 
Researchers and (Mentors): 
Rui Ning, Yue Jiang, Jihyun Baek, (Usha Raghuram), (Mark Zdeblick), (Don Gardner), (Daihong Huh)
List of Important Equipment: 
Nano Nugget(s): 

Some processing details for printing patterns for silicon nanowire fabrication.

Procedures for doing NIL in preparation for MACE etching.

Procedures for doing MACE etching to make tall pillars in silicon.