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SiNWs Thermoelectric Device Process Development

Project Type: 
E241
Date: 
March 2020
Areas of Interest: 
SiNW formation, MACE Etching
Report(s): 
F19- Silicon Nanowires Thermoelectric Device Process Development Final Report
W20- Silicon Nanowires Thermoelectric Device Process Development Final Report
Processing Technique (former Function and Method): 
Photolithography
Researchers and (Mentors): 
Rui Ning, Yue Jiang, Jihyun Baek, (Usha Raghuram), (Mark Zdeblick), (Don Gardner), (Daihong Huh)
List of Important Equipment: 
Heidelberg MLA 150 - 2 (heidelberg2)
Nano Nugget(s): 

SOP for patterning Si wafers on heidelberg2

Some processing details for printing patterns for silicon nanowire fabrication.

SOP for Nano Imprint Lithography

Procedures for doing NIL in preparation for MACE etching.

SOP for Metal Assisted Chemical Etching (MACE)

Procedures for doing MACE etching to make tall pillars in silicon.

Presentation(s): 
SiNWs Thermoelectric Device Process Development- Fall 2019 Final Presentation